Catalogue published in conjunction with the joint exhibition 'Second Skin' of two Hong Kong artists, Wilson Shieh and Chow Chunfai at Osage Singapore from 17 July to 19 Sep 2009.
'The act to perform the rites of disguise takes two artists from Hong Kong to a space of re-appearance. Wilson Shieh and Chow Chun Fai are not only interested in but are also fascinated with re-dress, or the ways in which habits are woven as fabric of social life, worn as second skin, shed, mixed and matched, kept, and reinvented as camp or retro in gongbi (Chinese fine brush) or Shanghai Tang.
Shieh creates templates in painting, drawing, and printing; and Chow in video, photography, and performance. In a certain way, this movement of form is prefigurative because it involves some kind of cross-dressing, transgressing the self in the playing of roles in art and transcribing the gesture in other forms like drawing or installation.' - excerpts from Quick Change, Patrick D. Flores.
With biographies of artists.
'The act to perform the rites of disguise takes two artists from Hong Kong to a space of re-appearance. Wilson Shieh and Chow Chun Fai are not only interested in but are also fascinated with re-dress, or the ways in which habits are woven as fabric of social life, worn as second skin, shed, mixed and matched, kept, and reinvented as camp or retro in gongbi (Chinese fine brush) or Shanghai Tang.
Shieh creates templates in painting, drawing, and printing; and Chow in video, photography, and performance. In a certain way, this movement of form is prefigurative because it involves some kind of cross-dressing, transgressing the self in the playing of roles in art and transcribing the gesture in other forms like drawing or installation.' - excerpts from Quick Change, Patrick D. Flores.
With biographies of artists.
Access level
Onsite
publisher
editor
Location code
EX.SIN.SES
Language
Chinese - Traditional,
English
Publication/Creation date
2011
No of pages
92
ISBN / ISSN
9789881972026
No of copies
2
Content type
catalogue
Chapter headings
Quick Change / 善變 - Patrick D. FLORES
Outfit / 裝 - Patrick D. FLORES
Surface / 表面 - Patrick D. FLORES
Second Skin: Curated by Patrick D. Flores
What does this mean?
This item is covered by one or more copyrights. It is available for research only or use within Hong Kong’s fair dealing rules. Please do not copy, re-use or reproduce this item without the permission of the copyright holder.